Lithographic projection apparatus

摘要

A lithographic projection apparatus comprising: a radiation system for supplying a projection beam PB of radiation; a mask table provided with a mask holder for holding a mask; a substrate table provided with a substrate holder for holding a substrate; a projection system PL for imaging an irradiated portion of the mask onto a target portion of the substrate, the substrate holder having a supporting face for supporting a substrate, the said supporting face being at least partially coated with a layer of electrically conductive material. <IMAGE>