发明名称 Ion plating apparatus
摘要 PCT No. PCT/JP97/03436 Sec. 371 Date Jun. 28, 1999 Sec. 102(e) Date Jun. 28, 1999 PCT Filed Sep. 26, 1997 PCT Pub. No. WO99/16924 PCT Pub. Date Apr. 8, 1999Around hearths 30a and 30b placed inside a vacuum chamber 11, auxiliary hearths 31a and 31b with annular permanent magnets included therein are arranged. Orientations of magnetic poles of annular permanent magnets 21a and 21b provided in two adjacent plasma guns 1A and 2B, orientations of magnetic poles of two adjacent electromagnetic coils 22a and 22b, orientations of two adjacent steering coils 24a and 24b, and orientations of magnetic poles of the two adjacent annular permanent magnets included in the two hearths are reversed from each other.
申请公布号 US6160350(A) 申请公布日期 2000.12.12
申请号 US19990269737 申请日期 1999.06.28
申请人 SUMITOMO HEAVY INDUSTRIES, LTD. 发明人 SAKEMI, TOSHIYUKI;TANAKA, MASARU
分类号 C23C14/32;H01J37/32;(IPC1-7):H01J7/24;H05B31/26 主分类号 C23C14/32
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