Composition comprising photosensitive saponified poly(vinyl acetate) and pattern formation method making use of the composition

摘要

A photosensitive resin composition which includes a photosensitive saponified PVA having a pendant group derived from a quaternary styrylpyridinium or styrylquinolinium, or a derivative thereof. The composition comprises a photosensitive saponified PVA which has structural units represented by formulas (1) to (4): <CHEM> which product is dissolved in at least one organic solvent selected from the group consisting of compounds represented by formulas (5), (6), and (7). <CHEM> <CHEM> <CHEM> The resin composition can be dissolved in a comparatively safe high-boiling-point solvent, such as propylene glycol, and can be developed with water.