APPARATUS FOR EXPOSING A PATTERN ON A SEMICONDUCTOR

摘要

PURPOSE: An exposure apparatus for a semiconductor wafer pattern using a light emitting diode(LED) is provided to reduce manufacturing cost and to decrease a space necessary for a semiconductor wafer process, by performing an exposure process by using the LED and a memory unit where a plurality of pattern data are stored. CONSTITUTION: A plurality of light emitting units are located at a predetermined height on a wafer(40). The plurality of light emitting units are smaller than respective chips(42) by a predetermined size, selectively generating light under predetermined control. A power unit applies a driving power to the light emitting unit. Data of a predetermined pattern is stored in a memory unit(90). A control unit selectively controls application to the light emitting unit according to pattern data read from the memory unit.