Stage apparatus for holding workpiece e.g. semiconductor wafer has magnetic motor for moving stage along X-axis and nonmagnetic motor for moving stage along Y-axis

摘要

The apparatus includes a stage (100) which is moved by a magnetic motor (112a) along a first axis (X). A nonmagnetic motor (103a,103b) is coupled to the stage to move it in along a second axis (Y). While the stage is moving, the relative duty cycle of the magnetic motor is substantially larger than that of the nonmagnetic motor. A microscope may be provided for observing the workpiece, a constant distance being maintained between the magnetic motor and the microscope. The magnetic motor may be a vacuum compatible brushless linear servomotor. The nonmagnetic motor may be a vacuum compatible linear piezoelectric motor. An Independent claim is included for a method of moving a stage.