发明名称 TRANSFER METHOD OF SPHERICAL MEMBER FOR BUMP ELECTRODE FORMATION, MANUFACTURE OF SEMICONDUCTOR DEVICE, AND TRANSFER MASK
摘要 PROBLEM TO BE SOLVED: To provide a method wherein spherical members for bump electrode formation such as a large number of metal balls can be exactly and effectively transferred one by one, and productivity is satisfactory or a manufacturing method of a semiconductor device, and additionally a mask for transfer used in the method. SOLUTION: In a process where flux 8 is mounted on an UBM film 7 formed on an Si wafer 5, a metal ball 1 is transferred to the flux 8, and a bump 13 is formed by reflow, a guide mask (a mask for transfer) 10 is used for transfer of the metal ball 11. The guide mask 10 has an aperture 9, into which the one metal ball 11 can be dropped. The aperture 9 has a diameter in the depth direction which is larger than that of entrance side.
申请公布号 JP2000332044(A) 申请公布日期 2000.11.30
申请号 JP19990141050 申请日期 1999.05.21
申请人 SONY CORP 发明人 OBINATA KENICHI
分类号 H05K13/02;H01L21/60 主分类号 H05K13/02
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