| 摘要 |
<p>A gas for plasma reaction comprising octafluorocyclopentene, characterized in that the gas has a content of octafluorocyclopentene of 99.9 vol % or more, and the total amount of nitrogen and oxygen which are contained as residual trace gas components is 200 vol ppm or less. This high purity gas for plasma reaction can be produced by (1) a method comprising subjecting a crude octafluorocyclopentene to a rectification in an atmosphere of an inert gas belonging to Group 0, or (2) a method comprising reftificating a crude octafluorocyclopentene to a purity of 99.9 vol % or more, and subsequently removing residual impurities.</p> |
