| 摘要 |
PROBLEM TO BE SOLVED: To provide a single-wafer surface working device which can improve reproducibility of the start of surface working with a new constitution, and accordingly, can control surface working amounts only by the time. SOLUTION: An etching pot 1 is constituted, in such a way that the pot 1 can be filled up with an etchant, and at the same time, can support a silicon wafer 4 on its bottom with the surface to be worked of the wafer 4 upward so that the surface is covered with the etchant. A liquid feeding and discharging block 23 is positioned at a point immediately above the pot 1 or its vicinity and temporarily stores a prescribed amount of etchant. The etchant stored in the block 23 is supplied to the pot 1 by means of an opening/closing means (composed of a valve disc 35, a cylinder 36, and a spring 38), which opens and closes a transfer passage 33 connecting the block 23 to the pot 1.
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