发明名称 POSITIVE PHOTOSENSITIVE COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a positive photosensitive composition having high sensitivity to infrared laser beams and excellent development latitude and storage stability. SOLUTION: The positive photosensitive composition contains a polymer compound having acid groups and an infrared absorber represented by a general formula 1, and this composition has limited solubility in an aqueous alkaline solution before irradiation with infrared rays and becomes soluble in an aqueous alkaline solution by irradiation with infrared rays. In the formula 1, each of X and Y is an O, S, Se, or Te atom; M is a methine chain having conjugated >=5C atoms; each of Rx1-Rx4 and Ry1-Ry4 is an H or halogen atom or a cyano group or the like and W is an anion.
申请公布号 JP2000330271(A) 申请公布日期 2000.11.30
申请号 JP19990141993 申请日期 1999.05.21
申请人 FUJI PHOTO FILM CO LTD 发明人 NAKAMURA TATSUO;KUNIDA KAZUTO;KITATANI KATSUSHI
分类号 G03F7/004;B41N1/14;G03F7/039 主分类号 G03F7/004
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