BASE PROPAGATOR, BASE PROPAGATOR COMPOSITION, REACTIVE BASE COMPOSITION AND PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To obtain a base propagator which is decomposed by the action of a base and forms a new base and to obtain a composition containing the base propagator. SOLUTION: The base propagator comprises a urethane compound containing at least one urethane bond. The urethane compound is decomposed by the action of a base derived from an amino group forming the urethane bond and generates a base derived from the urethane bond. The base propagator composition consists of the base propagator and a base generating agent. A photosensitive composition consisting of the base propagator, a photo-base generating agent and a polymerizable epoxy compound is prepared and used as a pattern forming material to form the objective pattern.