| 摘要 |
PROBLEM TO BE SOLVED: To prevent generation of contamination on a substrate due to dust, etc., by processing the substrate from its one-sided surface, when processing it in the state of supporting it, and by making the support contacted only with the whole periphery not unnecessary requiring processing. SOLUTION: A contact porting 24 of a support member 1 with a substrate 2 is set only to the peripheral edge portion of the substrate 2, and the substrate 2 is supported over the whole periphery of its peripheral edge portion only in the substrate 2 and the contacting portion 24, when observing it from its upper side. In this way, when rinsing a rear surface 22 of the substrate 2, the support member 1 for supporting the substrate 2 chucks an element-forming surface of the substrate 2 (the front surface thereof), and it supports the substrate 2 by selecting as its top surface the rear surface 22 of the substrate 2. At this time, the contacting portion 24 of the supporting member 1 with the substrate 2 corresponds to the processing unnecessary portion of an element forming surface 21 of the substrate 2. Furthermore, a rear-surface rinsing nozzle 6 for rinsing the rear surface 22 of the substrate 2 is provided on the same side as its resist nozzle, to perform both its resist-applying and rinsing treatments on the same side. |
