发明名称 THIN-FILM PIEZOELECTRIC ELEMENT
摘要 <p>PROBLEM TO BE SOLVED: To obtain characteristics of an incommensurablly wide band by providing a metal thin film as an epitaxial film on an Si substrate and forming a PZT thin film, which is epitaxial in 90 deg. domain structure wherein (100) orientation and (001) orientation are mixed at a specific atomic ratio Ti/(Ti+Zr), on it. SOLUTION: On the Si substrate 2 in which a via hole 1 is formed, a buffer layer 3, a base electrode 4 formed of Pt, a PZT thin film 5, and an upper electrode 6 made of Au are provided in this order. This PZT thin film 5 has a 0.65 to 0.90 of atomic ratio Ti/(Ti+Zr) and is a 90 deg. domain structure epitaxial film where (100) orientation and (001) orientation are mixed. Further, the base electrode 4 is a (001)-orientation epitaxial film, the reverse surface of the Si substrate 2 is adhered to the bottom surface of a package 11 with a die-bonding agent 10, and the upper part of the package 11 is sealed with a lid 13. Consequently, the constituted thin film bulk wave resonator obtains superior piezoelectric characteristics without polarizing processing the PZT film 5.</p>
申请公布号 JP2000332569(A) 申请公布日期 2000.11.30
申请号 JP19990139997 申请日期 1999.05.20
申请人 TDK CORP 发明人 YANO YOSHIHIKO;NOGUCHI TAKAO;ABE SHUSUKE;SAITO HISATOSHI
分类号 H01L41/09;C30B29/32;H01L41/08;H01L41/18;H01L41/187;H03H3/04;H03H9/02;H03H9/17;(IPC1-7):H03H9/17 主分类号 H01L41/09
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