发明名称 Use of a chemically reactive plasma for thermal-chemical processes
摘要 A method for optimizing the efficiency of an inductively coupled plasma (ICP) torch by varying at least one of a plasma gas flow rate and a power level applied to energize the ICP torch, and method and apparatus for efficiently using a CO2 feed as both a reactant and for generating a thermal plasma to produce high value chemical feed stocks, such as a synthesis gas or carbon monoxide from low value feedstocks, such as methane or carbon.
申请公布号 US6153852(A) 申请公布日期 2000.11.28
申请号 US19990249657 申请日期 1999.02.12
申请人 BLUTKE, ANDREAS S.;BOHN, EDWARD M.;OTTINGER, ROBERT S.;TUSZEWSKI, MICHEL G.;VAVRUSKA, JOHN S. 发明人 BLUTKE, ANDREAS S.;BOHN, EDWARD M.;OTTINGER, ROBERT S.;TUSZEWSKI, MICHEL G.;VAVRUSKA, JOHN S.
分类号 F23G5/08;H05H1/30;(IPC1-7):B23K10/00 主分类号 F23G5/08
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