| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a deposition apparatus which is capable of observing/ evaluating a thin film growth surface in real time without the impairment of the function as the deposition apparatus. SOLUTION: This aperture has a UV irradiation device 20 which irradiates the deposition surface of a substrate 7 to be grown with UV rays, a lens barrel 10 which images the photoelectrons released from the substrate 7 to be grown, a fluorescent plate 16 which displays the electronic intensity distribution on the image forming plane of the photoelectrons, an electron gun 8 which irradiates the deposition surface with an electron beam at an angle of 1 to 2 deg. and a fluorescent plate 9 which projects the diffraction patterns of the reflected electron beam from the deposition surface. A plurality of evaporation sources for deposition with shutters are installed on the circumference around the lens barrel at the front end of the lens barrel 10.</p> |
