| 摘要 |
PROBLEM TO BE SOLVED: To reduce the wafer storage or carrying by convenient means and prevent the natural oxide film from growing and avoid organic matter contamination on wafers by incorporating a chemical absorptive filter in a fan filter unit. SOLUTION: A filter 3 contg. a chemical absorbent is provided as a filter to be incorporated in a fan filter unit 1. The filter 3 removes organic substances, ozone or moisture in a semiconductor manufacturing apparatus. The chemical absorbent is pref. active carbon, ceramics or silica gel. A wafer 5 housed in a cassette 6 carried in a wafer inlet/outlet is exposed to an atmosphere purified by the filter 3 in each manufacturing process step and hence never subjected to the organic matter contamination and no natural oxide film grows.
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