发明名称 METHOD FOR TREATING A SUBSTRATE WITH HEAT SENSITIVE AGENTS
摘要 The present invention provides a method for treating a substrate, or a plurality of substrates, so that the treatment thereof is enhanced. In particular, the method includes the steps of causing a heated liquid to contact the substrate(s) and causing a processing liquid to contact the substrate(s). Although the processing liquid comprises a heat sensitive agent, the effectiveness of the processing liquid is not substantially diminished by the application of heat due to the fact that the heat is applied by the application of a separate heated liquid rather than by heating the processing liquid itself. Thus, the application of heat can be utilized to enhance the treatment rate of a substrate surface without a corresponding reduction in effectiveness of the processing liquid.
申请公布号 WO0070667(A1) 申请公布日期 2000.11.23
申请号 WO2000US12927 申请日期 2000.05.11
申请人 FSI INTERNATIONAL, INC.;NELSON, STEVEN, L.;CHRISTENSON, KURT, K. 发明人 NELSON, STEVEN, L.;CHRISTENSON, KURT, K.
分类号 B08B3/02;B08B3/10;H01L21/306;(IPC1-7):H01L21/306 主分类号 B08B3/02
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