发明名称 SEMICONDUCTOR DEVICE
摘要 Performance for a gate insulation film of an insulated gate transistor is enhanced. A depletion layer is generated in a region of a gate electrode 12 which is provided in contact with a gate insulation film 4 in an OFF state, and the depletion layer disappears or a width thereof is reduced in an ON state.
申请公布号 KR100271745(B1) 申请公布日期 2000.11.15
申请号 KR19980007247 申请日期 1998.03.05
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 KUSUNOKI, SHIGERU
分类号 H01L21/8247;H01L21/74;H01L21/8242;H01L21/8246;H01L27/105;H01L27/108;H01L27/115;H01L29/423;H01L29/49;H01L29/78;H01L29/786;H01L29/788;H01L29/792 主分类号 H01L21/8247
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