发明名称 SEMICONDUCTOR APPARATUS FOR DISTRIBUTING PHOTORESIST AND METHOD FOR DETERMINING WHEN TO EXCHANGE RECEPTACLES USING THE APPARATUS
摘要 PURPOSE: A semiconductor apparatus for distributing photoresist is provided to minimize the loss of photoresist, by using a stepping motor to distribute minimum quantity of the photoresist needed to form a photoresist layer applied on a semiconductor wafer. CONSTITUTION: A semiconductor apparatus for distributing photoresist comprises a memory block(204), a control block(202), a motor driving block(206) and a photoresist distributor(208). The memory block stores an established recipe for distributing the photoresist. The control block generates a distribution control initialization signal when a wafer settles in a settling part of a coating unit, and generates a driving control signal for controlling a distribution by the established recipe. The motor driving block generates a driving signal of a stepping motor by using a power supplied from the exterior in response to the driving control signal. The photoresist distributor has the stepping motor operated by the motor driving signal, and initializes a distribution control position in response to the initialization signal. And the photoresist distributor controls the quantity of the photoresist exhausted from the receptacle and supplied to the coating apparatus.
申请公布号 KR20000066175(A) 申请公布日期 2000.11.15
申请号 KR19990013080 申请日期 1999.04.14
申请人 NYMTECH CO., LTD. 发明人 KO, WAN TAEK;SUNG, NO YEONG
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
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