| 摘要 |
PURPOSE: A working pattern alignment apparatus of a shadow mask is provided to effectively align the upper and lower glasses by fixing the upper glass of the working pattern for the shadow mask, confirming the alignment state of the upper glass to the lower glass with a camera and moving the position of the lower shadow mask. CONSTITUTION: Two working pattern glasses for a shadow mask are aligned as stacked with one on the other in a chamber(60). The chamber(60) is supported by a frame. The lower glass is settled on a lower absorbing plate(61) which is placed on the bottom of the chamber by a plurality of thrust bearings. The lower absorbing plate(61) is transported by a lower absorbing plate drive. The upper glass is absorbed by an upper absorbing plate(62) which moves up and down above the upper glass. A plurality of cameras confirms alignment marks inscribed in the glasses. The upper absorbing plate(61) is transported by an upper absorbing drive(70). An ultraviolet radiation lamp radiates ultraviolet ray to bind the working pattern glasses.
|
