APPARATUS FOR MANUFACTURING SEMICONDUCTOR IN HIGH VACUUM STATE

摘要

PURPOSE: An apparatus for manufacturing a semiconductor in a high vacuum state is provided to reduce an affection of a pressure variance of a process chamber on a manufacturing process, by properly controlling the pressure of the process performed in a high vacuum state. CONSTITUTION: An apparatus for manufacturing semiconductor comprises a process chamber(4,5,6), a pumping line and a pressure control valve(41-46,51-56,61-63). The process chamber processes a semiconductor wafer in a high vacuum state. The pumping line controls the quantity of gas outputted from the process chamber, and adjusts the pressure within the process chamber. At least one pressure control valve is established between the process chamber and the pumping line.