发明名称 |
Apparatus and method for on-line decomposition of hydrogen peroxide solution in fabrication of semiconductor device |
摘要 |
An apparatus and method for on-line decomposition of a hydrogen peroxide solution, for use in fabricating a semiconductor device, includes a membrane tube having a porous plug inserted in each end, with the porous plugs defining a space where a platinum catalyst is disposed. A first coupling tube is inserted into one end of the membrane tube to supply a hydrogen peroxide sample to the membrane tube. The hydrogen peroxide contained in hydrogen peroxide sample is decomposed into water and oxygen gas according to an action of the platinum catalyst. A second coupling tube is inserted into a second end of the membrane tube to discharge a diluted hydrogen peroxide solution to an analytical instrument, where the decomposed hydrogen peroxide solution is analyzed on-line.
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申请公布号 |
US6146898(A) |
申请公布日期 |
2000.11.14 |
申请号 |
US19980157945 |
申请日期 |
1998.09.22 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KANG, SUNG-CHUL;LEE, DONG-SOO |
分类号 |
B01D63/06;B01D71/26;B01D71/32;B01J7/00;B01J8/00;B01J8/06;B01J23/42;C01B13/02;C02F1/58;G01N5/00;G01N33/00;G01N33/18;H01L21/66;(IPC1-7):G01N33/20 |
主分类号 |
B01D63/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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