发明名称 Apparatus and method for on-line decomposition of hydrogen peroxide solution in fabrication of semiconductor device
摘要 An apparatus and method for on-line decomposition of a hydrogen peroxide solution, for use in fabricating a semiconductor device, includes a membrane tube having a porous plug inserted in each end, with the porous plugs defining a space where a platinum catalyst is disposed. A first coupling tube is inserted into one end of the membrane tube to supply a hydrogen peroxide sample to the membrane tube. The hydrogen peroxide contained in hydrogen peroxide sample is decomposed into water and oxygen gas according to an action of the platinum catalyst. A second coupling tube is inserted into a second end of the membrane tube to discharge a diluted hydrogen peroxide solution to an analytical instrument, where the decomposed hydrogen peroxide solution is analyzed on-line.
申请公布号 US6146898(A) 申请公布日期 2000.11.14
申请号 US19980157945 申请日期 1998.09.22
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KANG, SUNG-CHUL;LEE, DONG-SOO
分类号 B01D63/06;B01D71/26;B01D71/32;B01J7/00;B01J8/00;B01J8/06;B01J23/42;C01B13/02;C02F1/58;G01N5/00;G01N33/00;G01N33/18;H01L21/66;(IPC1-7):G01N33/20 主分类号 B01D63/06
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