| 摘要 |
PROBLEM TO BE SOLVED: To allow alignment mark of a photomask to be drawn on the outside of a substrate, as well as to be aligned in a sufficient accuracy and allow it not to be baked on the substrate. SOLUTION: In this alignment method, a substrate 4 having an alignment mark 5 and a photomask 1 in which an alignment mark 3 is drawn on the outside of the substrate 4 are moved relatively to align both alignment marks 3 and 5 with each other. In this case, after one alignment mark is photographed, its image is processed and is projected as a reference image, then the other alignment is photographed and is subjected to image processing, and it is overlapped on the projected reference image and they are indicated. When both alignment marks 3 and 5 are not aligned with each other, the substrate 4 and the photomask 1 are moved relatively so as to align both alignment marks 3 and 5 with each other. |
