| 摘要 |
PROBLEM TO BE SOLVED: To suppress degradation in breakdown strength by suppressing oxygen diffusion in a semiconductive film. SOLUTION: After a semiconductive film 15 is formed, a conductive film is continuously formed on it within the same oven. Thus, when a hot water is carried out of the oven into the atmosphere, the oxygen in the atmosphere is prevented from diffusing into the semiconductor film 15. After protecting the semiconductive film 15, the entire conductive film is etched. |
