发明名称 Field effect transistor
摘要 There is provided a field effect transistor including a semi-insulating semiconductor substrate formed with a recess at a region in which a gate is to be formed, a gate base layer formed on the recess and composed of one of an InP layer and a plurality of layers including an InP layer, and a gate electrode formed on the gate base layer. The InP layer may be replaced with an InGaP layer, an AlXGa1-XAs (0</=X</=1) layer, an InXGa1-XAs (0</=X</=1) layer, or an InXAl1-XAs (0</=X<0.4 or 0.6<X</=1) layer. The above-mentioned field effect transistor prevents thermal instability thereof caused by impurities such as fluorine entering a donor layer to thereby inactivate donor. As a result, there is presented a highly reliable compound field effect transistor.
申请公布号 US6144049(A) 申请公布日期 2000.11.07
申请号 US19980017137 申请日期 1998.02.02
申请人 NEC CORPORATION 发明人 ONDA, KAZUHIKO
分类号 H01L29/812;H01L21/338;H01L29/778;(IPC1-7):H01L29/778 主分类号 H01L29/812
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