发明名称 SPACER FOR ELECTRON BEAM DEVICE, ITS MANUFACTURE AND ELECTRON BEAM DEVICE USING IT
摘要 PROBLEM TO BE SOLVED: To suppress electrification and prevent the orbit of electrons from being warped when it is used for an electron beam device by forming an irregular roughened layer on the spacer substrate of an interval maintaining structural body (spacer) arranged between an electron source and a plate facing the electron source, and including fine grains and a binder in the roughened layer. SOLUTION: This spacer is provided with a spacer substrate 1 and a roughened layer 4 covering the spacer substrate 1, and the roughened layer 4 includes fine grains and a binder. Irregularities on the spacer substrate 1 mitigate the incidence angle for multiple directions. A high-resistance film 2 for preventing electrification is formed on the surface of the spacer substrate 1. The high-resistance film 2 finally forms irregularities after the surface irregularities of the roughened layer 4 formed on the spacer substrate 1. A low- resistance film 3 for obtaining the ohmic contact between upper and lower electrode substrates and the spacer is formed.
申请公布号 JP2000311609(A) 申请公布日期 2000.11.07
申请号 JP20000047547 申请日期 2000.02.24
申请人 CANON INC 发明人 ITO YASUHIRO
分类号 H01J9/24;H01J5/03;H01J29/87;H01J31/12;(IPC1-7):H01J9/24 主分类号 H01J9/24
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