EXPOSURE MONITOR MASK, EXPOSURE REGULATION METHOD AND PRODUCTION OF SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To make it possible to execute the regulation of exposure with high accuracy without excellent line width measurement. SOLUTION: A pair of patterns 104 (104a and 104b) for relative position detection and an exposure monitor pattern 101 held by these patterns for relative position detection are arranged and formed in an x-axis (one direction) in a pattern 100 for exposure detection arranged at an exposure monitor mask. A pair of patterns 105 (105a and 105b) for y-axis direction mispositioning quantity detection are formed across the exposure monitor pattern 101 in the y-axis direction orthogonal with the x-axis direction. The exposure monitor pattern 101 is formed of an opening pattern 102 and an intensity change pattern 103 to monotonously change the irradiation intensity distribution of the exposure light to be transmitted in an x-axis direction and to connect to the pattern in the x-direction.