| 摘要 |
PROBLEM TO BE SOLVED: To obtain a high-efficiency substrate manufacturing line by issuing an alarm when an abnormality due to generation of a foreign body is detected on a substrate by monitoring. SOLUTION: An oblique illumination system which is composed of an illumination array is provided. An image-formation optical system which is constituted of a lens array or a microlens group is provided. A spatial filter which is arranged on the Fourier transform face of the image-formation optical system is provided. A detector which is arranged in the image-formation position of the image-formation optical system is provided. In addition, a foreign-body monitoring device which detects the generated state of a foreign body on a semiconductor substrate is installed at the entrance or the exit of a treatment device or at a conveyance system between a plurality of treatment devices. Consequently, the generated state of a defect due to the foreign body on the substrate can be detected by the treatment device in a substrate manufacturing process. When the generated state of the defect due to the foreign body is processed so as to sort a generation mode, the cause for generation of the defect due to the foreign body can be investigated by analyzing the component of the generated defect due to the foreign body. |
