发明名称 SUBSTRATE CONTACT FOR A CONDUCTIVE TROUGH IN A SEMICONDUCTOR
摘要 The invention relates to a contactless butted substrate contact in which supply potential (VDD) is fed from a contact (24), said contact contacting a drain or source region (12), to an N-conductive trough (11) via a salicide layer (28) and substrate (27).
申请公布号 WO0065656(A1) 申请公布日期 2000.11.02
申请号 WO2000DE01247 申请日期 2000.04.20
申请人 INFINEON TECHNOLOGIES AG;ZIEHFREUND, RALPH;OSTERMAYR, MARTIN;BRATU, PETER;GEBHARDT, KARL-HEINZ 发明人 ZIEHFREUND, RALPH;OSTERMAYR, MARTIN;BRATU, PETER;GEBHARDT, KARL-HEINZ
分类号 H01L27/11 主分类号 H01L27/11
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