| 摘要 |
PROBLEM TO BE SOLVED: To further accurately measure the beam current by improving the S/N ratio, in measurement of the beam current in an ion implanter. SOLUTION: In this beam current measuring device, one small hole 30 through which ion beams pass is provided on a rotary disk 10 to be mounted with wafers to be ion-implanted, the ion beams which have passed through the small hole 30 are detected by a Faraday cup 50, and the ion beam current is measured. In this case, the Faraday cup 50 has such the size as to cover the irradiation range of ion beams on a moving locus of the small hole 30, formed by the rotation of the rotary disc.
|
