发明名称 |
Temperature controller for plasma processing |
摘要 |
The temperature of a substrate on the rotating table connected to the high voltage high frequency generator in a Plasma PVD or CVD reactor is measured by way of a tube, containing a inconel scaling tube with thermocouple. The signal of the thermocouple is transformed into optical signals. The optical signals are then transmitted to microprocessing means which generated signals representing the temperature of the substrate. |
申请公布号 |
AU3547400(A) |
申请公布日期 |
2000.11.02 |
申请号 |
AU20000035474 |
申请日期 |
2000.03.30 |
申请人 |
CHESSEN GROUP INC. |
发明人 |
ANDREY GINOVKER;VLADIMIR CHEREPANOV |
分类号 |
C23C14/54;H01J37/32;H01L21/00 |
主分类号 |
C23C14/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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