发明名称 ALIGNER SYSTEM, ALIGNER, AND APPARATUS METHOD FOR MANUFACTURING SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To dispense with the parameter value setting work by an operator and also parameter value estimation by the operator. SOLUTION: An exposure device system is provided with a plurality of aligners 2011 and 2012 and their server 202, in such a way that the software of the aligner 2011 and 2012 can be upgraded and has parameters, the initial values of which are to be set upon upgrading the software. The server 202 is provided with a means, which finds the initial value of the parameter to be set for the aligner device having software to be upgraded, based on the value of the same kinds of parameters in other aligners and a transfer means which transfers the found initial value to the aligners having the software to be upgraded.
申请公布号 JP2000306823(A) 申请公布日期 2000.11.02
申请号 JP19990117580 申请日期 1999.04.26
申请人 CANON INC 发明人 KIYOUTOKU SATOSHI
分类号 G06F9/06;H01L21/027;(IPC1-7):H01L21/027 主分类号 G06F9/06
代理机构 代理人
主权项
地址