发明名称 |
ASYMMETRIC OPTICAL WAVEGUIDE NITRIDE LASER DIODE STRUCTURE AND ITS FORMATION AND MANUFACTURE |
摘要 |
PROBLEM TO BE SOLVED: To provide an asymmetric optical waveguide nitride laser diode structure which does not require a p-type waveguide layer nor tunnel barrier layer containing aluminum in a large amount. SOLUTION: An asymmetric optical waveguide nitride laser diode structure 400 has an active layer 120 having first and second surfaces, a transition layer 429 which is brought into contact with the first surface of the active layer 120, a p-type clad layer 130 adhered adjacently to the transition layer 429, and an n-type layer 116 which is brought into contact with the second surface of the active layer 120.
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申请公布号 |
JP2000307199(A) |
申请公布日期 |
2000.11.02 |
申请号 |
JP20000104311 |
申请日期 |
2000.04.06 |
申请人 |
XEROX CORP |
发明人 |
VAN DE WALLE CHRISTIAN G;BOUR DAVID P;KNEISSL MICHAEL A;ROMANO LINDA T |
分类号 |
H01S5/20;H01S5/30;H01S5/323;H01S5/343;(IPC1-7):H01S5/343 |
主分类号 |
H01S5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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