| 摘要 |
PURPOSE: A thin film actuated mirror array is provided to prevent a short circuit between a top electrode and a bottom electrode, and to prevent an active layer from being cracked. CONSTITUTION: An active matrix(100) includes M by N MOS transistors and a drain pad(105) extended from a drain of the transistor. A support layer(125) has one side connected to a top of the active matrix(100). The other side of the support layer(125) is formed in parallel, with an air gap(160) interposed therebetween. A bottom electrode(130) is formed on the support layer(125) and is partitioned by an Iso-Cut part according to each pixel. An active layer(135) is formed on the bottom electrode(130), and a separation layer(138) is formed at a step portion between the Iso-Cut part and the active layer(135). An etch protection layer(152) is formed on a sidewall of the separation layer(138), and a top electrode(140) is formed on the active layer(135).
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