发明名称
摘要 PURPOSE:To improve the labor efficiency of semiconductor junction forming work by shortening the time required by a impurity diffusing process for semiconductor and, at the same time, by making the impurity diffusing process and reheating process to be easily performed under different temperature conditions and separately performing the carrying-in work and carrying-out work of substrates for solar battery. CONSTITUTION:A carrying-in door 3 and carrying-out door 4 are respectively provided to openings at both ends of a cylindrical body 2 and the inside of the body 1 is partitioned into a plurality of chambers by providing a partition door 6 together with a transferring mechanism 5 for solar battery substrates 1. A diffusion gas supplying port 7, diffusion gas discharging port 8, and first heating device 9 are provided in one chamber 2a and a second heating device 10, inert gas supplying port 12, and inert gas discharging port 13 are provided in the other chamber 2b. After the temperature in the chamber 2a is raised to 700-900 deg.C, the substrate 1 is carried in the chamber 2a by opening the door 3 while an N, gas is supplied to the chamber 2a and P is diffused in the substrate 1 by supplying such a diffusion gas as POC3, etc., and the remaining gas is forcibly discharged. Then the substrate 1 is transferred to the other chamber 2b after the inside of the chamber 2b is heated to 750-950 deg.C and the substrate is reheated for about one hour in an N2 atmosphere.
申请公布号 JP3103718(B2) 申请公布日期 2000.10.30
申请号 JP19940116997 申请日期 1994.05.30
申请人 发明人
分类号 H01L21/22;H01L31/04 主分类号 H01L21/22
代理机构 代理人
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