| 发明名称 |
Production process for a capacitor electrode formed of a platinum metal |
| 摘要 |
A production process for a capacitor electrode formed of a platinum metal includes producing a conductive electrode body on a substrate having a silicon-containing surface for the capacitor electrode. Platinum is deposited over the full surface, the platinum is silicized in a temperature step outside the electrode body and the platinum silicide is removed. The advantage of the invention is the avoidance of an etching process for metallic platinum.
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| 申请公布号 |
US6136659(A) |
申请公布日期 |
2000.10.24 |
| 申请号 |
US19980047850 |
申请日期 |
1998.03.25 |
| 申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
SCHINDLER, GUENTHER;HARTNER, WALTER;WEINRICH, VOLKER;MAZURE-ESPEJO, CARLOS |
| 分类号 |
H01L27/108;H01L21/02;H01L21/3213;H01L21/8242;H01L21/8246;H01L27/105;(IPC1-7):H01L21/20;H01L21/824 |
主分类号 |
H01L27/108 |
| 代理机构 |
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