发明名称 |
PRODUCTION OF ORGANOSILICON COMPOUND |
摘要 |
PROBLEM TO BE SOLVED: To produce the subject compound without using an amine by subjecting a specific silane compound and a specified organohalogen compound to a dehydrohalogenating reaction in the presence of a tertiary phosphine compound. SOLUTION: (A) An Si-H bond-containing silane compound represented by the formula HSiR1Cl2 (R1 is H, Cl, a 1-6C alkyl or phenyl) (e.g. trichlorosilane) in a molar amount of 1-10 times based on (B) an organohalogen compound represented by the formula R2CH2X (X is Cl or Br; R2 is a 1-17C alkyl, an F-substituted 1-10C fluoroalkyl, a 2-5C alkenyl or the like) (e.g. 1-chlorohexane) and the component B are subjected to a dehydrohalogenating reaction in the presence of (C) a tertiary phosphine compound (e.g. tri-n-butylphosphine) in an amount of 1-100 mol% based on the component B at 10-250 deg.C under atmospheric pressure or under sealed conditions for 1-48 h to produce the objective compound represented by the formula R4CH2SiR1Cl2 (R4 is R2 or the like). |
申请公布号 |
JP2000297091(A) |
申请公布日期 |
2000.10.24 |
申请号 |
JP20000015275 |
申请日期 |
2000.01.25 |
申请人 |
KOREA ADVANCED INST OF SCI TECHNOL |
发明人 |
TEI ITSUNAN;YOO BOK RYUL;CHO NENSOKU;KAN JUNSHU |
分类号 |
B01J31/02;B01J31/24;B01J31/30;C07B61/00;C07F7/12;C07F7/14 |
主分类号 |
B01J31/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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