| 摘要 |
PURPOSE: An exposure device is provided to prevent a failure of a line process by monitoring an output value of a laser beam for the line process or by regulating the output value of the laser beam. CONSTITUTION: An exposure device outputs a laser beam (e.g., He-Ne Laser Beam) in a laser generation part (3) by high voltage supplied from a high voltage supplying part (1). The output laser beam is incident to a reduced projection lens (7) through a half mirror (5). The laser beam output from the reduced projection lens (7) is irradiated to a semiconductor wafer (11) on a stage (9) and reflected. The reflected laser beam from the semiconductor wafer is detected in a reflected light detection part (13) through the reduced projection lens (7) and the half mirror (5, half mirror). A first detection signal detected from the reflected light detection part (13) is used for getting information of the exposure light position and the semiconductor wafer (11) position. |
