| 摘要 |
PROBLEM TO BE SOLVED: To eliminate a film of poor quality in the initial state after starting the formation of the film by optimizing the control on the opening and closing of a shutter. SOLUTION: After a first process, in which a substrate 9 is set up in a treating vessel 1 incorporating a heating element 4, and at the same time, the inside of the vessel 1 is maintained at a prescribed high temperature by setting the shutter 7 to a closed position, at which the heating element 4 is optically shielded from the substrate 9 and supplying energy to the heating element 4, a second process in which the introduction of a source gas into the vessel 1 is started. After the pressure in the vessel 1 and the flow rate of the gaseous start material are adjusted to prescribed values, a third process in which a prescribed thin film is formed on the substrate 9 by causing the shutter 7 to retreat to its opened position, at which the heating element 4 is not optically shielded from the substrate 9, is performed.
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