| 摘要 |
PROBLEM TO BE SOLVED: To provide the manufacturing method of a transparent conductive film improved so as to enhance transmissivity and reduce manufacturing cost. SOLUTION: A substrate is placed within a vacuum vessel. A target, which becomes a material of a transparent conductive film, is placed in the center of the vacuum vessel. Oxygen is introduced into the vacuum vessel. Laser beams are applied onto the target, atom/molecule ions emitted by ablation are deposited on the substrate, oxidized, and a crystal is grown. This method is called a laser ablation method, and utilized as the film forming method of a transparent conductive film. In the laser ablation, since an excimer laser acting as an exciting source is introduced from the outside of a film-forming device, film forming pressure and gas are not limited. There is no effect of reverse sputter caused by negative ions, which is a problem in a sputtering method. Control of the amount of oxygen is made easy, and a film having a composition similar to that of the target can be obtained. |
