发明名称 SUBSTRATE AND PET FILM
摘要 PROBLEM TO BE SOLVED: To negate the internal stress possessed by a thin film and to prevent the deformation of the substrate induced by thin film formation, i.e., the warpage generated in a flexible film-like material by forming the thin film on the substrate curved in a direction of negating the internal stress remaining in the thin film. SOLUTION: When the thin film 13 having the compressive residual internal stress is deposited on the surface of the flexible film-like substrate 3, the substrate 3 tends to warp to a crown shape with the deposited surface faced upward on account of the compressive stress. The substrate 3 is warped in an opposite direction at deposition, by which the stress by the warpage of the substrate 3 and the compressive internal stress possessed by the thin film are negated and a flat state is obtained. The residual internal stress of the thin film 13 is previously measured or the degree of curling is previously quantitatively recognized and the curvature meeting the deformation quantity by the residual internal stress of the thin film 13 is imparted to the substrate 3, by which the substrate 3 formed with the thin-film 13 is obtained. The radius of curvature at which the induction of wrinkles, flaws, etc. on the film does not occur is important.
申请公布号 JP2000297374(A) 申请公布日期 2000.10.24
申请号 JP20000082096 申请日期 2000.03.23
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 ITO KENJI
分类号 C08J5/18;C23C14/06;C23C16/27;(IPC1-7):C23C16/27 主分类号 C08J5/18
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