| 摘要 |
PROBLEM TO BE SOLVED: To make a composition for film under resist have both of adhesion to a resist, resistance to a resist developer and have resistance to oxygen ashing in the removal of the resist by incorporating a hydrolysate and/or a partial condensation product of a specified compound. SOLUTION: The composition for a film under a resist contains a hydrolysate and/or a partial condensation product of a compound of the formula Si(OR1)4, wherein R1 is a monovalent organic group such as alkyl, aryl or allyl, the alkyl is, e.g. methyl or ethyl, is preferably a 1-5C alkyl, may be linear or branched and may be a fluoroalkyl, and the aryl is, e.g. phenyl or naphthyl. The compound of the formula is, e.g. tetramethoxysilane, tetraethoxysilane. More preferably, the compound is tetra-n-propoxysilane, tetramethoxysilane or tetraethoxysilane. Two or more of such compounds may be simultaneously used. |
