发明名称 CATHODE SUPPORTING STRUCTURE AND ELECTRON GUN STRUCTURE
摘要 <p>PROBLEM TO BE SOLVED: To obstruct vapor deposition of an emitter vaporized from a cathode base substance on an insulating support by tapering a cathode holding cylinder so that the tip is gradually widened outward approaching a cathode base substance, and forming a flare for shutting off the emitter vaporized from the cathode base substance to the surface of the insulating support. SOLUTION: A cathode structure 5 is mounted on the inside of a cathode holding cylinder 2 to constitute a cathode supporting structure B. A first grid 6 is made of metal in a cup shape whose lower surface is opened, and the cathode supporting structure B, to a supporting frame 1 is fit to the inside of the first grid 6 to constitute an electron gun structure B. A flare 31 formed in the cathode holding cylinder 2 is tapered so as to widened toward the outer circumference side, a line C connecting a point A and a point B can make an angleθon the inside small compared with a case where the flare 31 is horizontal, and a point E where the line C reaches is located in a position distant from a cathode base substance 8.</p>
申请公布号 JP2000294160(A) 申请公布日期 2000.10.20
申请号 JP19990101322 申请日期 1999.04.08
申请人 TOSHIBA CORP 发明人 MATSUMOTO SADAO;HIGUCHI TOSHIHARU;KOYAMA KIYOMI;MURO NAOTO;UDA EIICHIRO
分类号 H01J1/18;H01J29/04;H01J29/48;(IPC1-7):H01J29/04 主分类号 H01J1/18
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