| 摘要 |
PURPOSE: An apparatus for exposing an edge region of a wafer is provided to avoid a duplicate exposure for the wafer edge region and thereby to reduce exposure time. CONSTITUTION: An exposure apparatus for a wafer edge region includes a light source(1') which transmits light to a wafer(3'), an adjustable slit(2') which adjusts the scope(T2) of light-transmission to the wafer(3'), and a wafer shifter which shifts the wafer(3') in a direction(6') of X or Y. The adjustable slit(2') is controlled by a controller so that the light-transmission scope(T2) can be greater than the width(E1) of the wafer edge region according to the predetermined alignment information. Additionally, the shifting path or position of the wafer shifter is controlled by the controller so that the side of the light-transmission scope(T2) may coincide with the boundary of an effective region of the wafer(3').
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