发明名称 APPARATUS FOR TREATING GAS
摘要 PURPOSE: An apparatus for treating gas is provided to prevent clogging of exhaust lines, thereby the life span of an apparatus for treating gas is not shortened. CONSTITUTION: An apparatus for treating gas has a system for selecting and exhausting gas containing water vapor wherein the apparatus is characterized by comprising: a) a chamber(200); b) a first exhaust line; c) a second exhaust line connecting the chamber to the first exhaust line; and d) a device for passing a gas from the chamber to the first exhaust line through a different path according to the kind of the gas which is positioned at the second exhaust line in which the device comprises a first subline for passing a gas containing water vapor to the first exhaust line and a second subline for passing a dry gas to the first exhaust line.
申请公布号 KR20000060414(A) 申请公布日期 2000.10.16
申请号 KR19990008672 申请日期 1999.03.15
申请人 SAMSUNG ELECTRONICS CO, LTD. 发明人 JUN, JAE GANG;HUH, SEONG JIN
分类号 B01D53/34;(IPC1-7):B01D53/34 主分类号 B01D53/34
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