发明名称 |
APPARATUS FOR TREATING GAS |
摘要 |
PURPOSE: An apparatus for treating gas is provided to prevent clogging of exhaust lines, thereby the life span of an apparatus for treating gas is not shortened. CONSTITUTION: An apparatus for treating gas has a system for selecting and exhausting gas containing water vapor wherein the apparatus is characterized by comprising: a) a chamber(200); b) a first exhaust line; c) a second exhaust line connecting the chamber to the first exhaust line; and d) a device for passing a gas from the chamber to the first exhaust line through a different path according to the kind of the gas which is positioned at the second exhaust line in which the device comprises a first subline for passing a gas containing water vapor to the first exhaust line and a second subline for passing a dry gas to the first exhaust line.
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申请公布号 |
KR20000060414(A) |
申请公布日期 |
2000.10.16 |
申请号 |
KR19990008672 |
申请日期 |
1999.03.15 |
申请人 |
SAMSUNG ELECTRONICS CO, LTD. |
发明人 |
JUN, JAE GANG;HUH, SEONG JIN |
分类号 |
B01D53/34;(IPC1-7):B01D53/34 |
主分类号 |
B01D53/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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