METHOD FOR FORMING OVERLAY MEASURING PATTERN OF SEMICONDUCTOR DEVICE

摘要

PURPOSE: A method for forming an overlay-measuring pattern of a semiconductor device is provided to improve the reliance of the semiconductor device by preventing the short between patterns. CONSTITUTION: An overlay-measuring pattern is provided for checking the arrangement between an upper layer and a lower layer. When the lower layer is formed, an outer measuring-pattern(41) is formed. The outer measuring-pattern(41) consists of bar patterns having a size identical to the size of a cell pattern. The bar patterns have a picture frame shape. When the upper layer is formed, an inner measuring-pattern(42) is formed. The inner measuring-pattern(42) consists of bar patterns having a size identical to the size of a cell pattern. The inner measuring-pattern(42) is disposed in the outer measuring-pattern(41).