发明名称 METHOD OF DEVELOPING PHOTOSENSITIVE RESIN PLATE AND DEVELOPING DEVICE
摘要 <p>A method of developing a photosensitive resin plate comprising, in order to greatly prolonging the service life of a developing solution and increase the number of plates that can be developed using a specified amount of the developing solution, supplying under circulation a developing solution (2) stored in a developer tank (1) and containing a surfactant to the surface of the tank (1), characterized in that a porous sheet (6) impregnated with a defoamer is disposed on or in the vicinity of the liquid surface of the developer tank (1) so that the developing solution (2) dropped from the surface of the photosensitive resin plate (5) passes through the porous sheet (6). &lt;IMAGE&gt;</p>
申请公布号 EP1043628(A1) 申请公布日期 2000.10.11
申请号 EP19980961476 申请日期 1998.12.22
申请人 ASAHI KASEI KOGYO KABUSHIKI KAISHA 发明人 OGAWA, NOBUO;KOJIMA, TSUTOMU
分类号 G03F7/30;(IPC1-7):G03F7/30 主分类号 G03F7/30
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