| 摘要 |
<p>An irradiation control method for a pulsed light source which can reduce a difference between the energy of a pulsed light measured before exposure and an actual energy. First, the average energy density of a pulse illuminating light IL (IL) having a predetermined oscillation frequency emitted from the excimer laser light source (16) on a wafer (W) is measured. Next, the oscillation frequency of the excimer laser light source is determined at the time of exposure of the wafer (W) Then, the energy of the illuminating light (IL) is adjusted when the determined oscillation frequency differs from the predetermined oscillation frequency. <IMAGE></p> |
