| 摘要 |
An exposure apparatus for a ball shaped substrate for manufacturing semiconductor devices. An exposure apparatus continually exposes light through a mask having a specified pattern to a surface of a ball shaped substrate. Holders each holding a ball shaped substrate are attached to an annular member that rotates continuously. Optics equipment guide the light from a light source to a surface of the substrate through a mask having a specified pattern. At the same time, optics equipment scans the light emission end to maintain the location relationship of the substrate with the annular member. The substrate is exposed while moving continuously.
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