| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate drying method and a device, where an exhaust equipment can be dispensed with or simplified, and drying fluid can be smoothly supplied. SOLUTION: This drying method is carried out through a manner where a substrate 1 is housed in a processing tank 3, and drying fluid is supplied into the tank 3 making the liquid level of cleaning liquid 2 in the tank 3 descend relatively with respect to the substrate 1, by which the surface of the substrate 1 is dried out. In this case, a drying fluid is supplied as a liquid into the tank 3 and sprayed on the surface of the cleaning liquid 2 by the use of a nozzle 5 provided at the end of a feed pipe 4.
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