Device manufacturing method

摘要

A device manufacturing method includes a first step for executing a multiple exposure to a first layer on a substrate, by use of a plurality of first masks, and a second step, to be executed after the first step, for executing a multiple exposure to a second layer on the substrate, by use of a plurality of second masks, wherein one of the second masks has a pattern portion of the same design rule as that of one of the first masks. <IMAGE> <IMAGE> <IMAGE>